The physical vapor deposition (PVD) coating process mainly achieves the deposition of the coating on the surface of the tool by arc evaporation or magnetron sputtering. Hauzer Techno Coating BV, a developer of PVD and plasma-assisted CVD coating technology in the Netherlands, is experimenting with PVD coatings using its second-generation high-energy excitation magnetron sputtering (HIPIMS+) coating technology. Process innovation and change.
According to Hauser, HIPIMS+ coating technology can overcome the shortcomings of arc evaporation technology that easily form droplets. The company notes that although the size and number of droplets can be reduced to within tolerable limits by proper cooling and arc motion control of the target, the HIPIMS+ coating surface is compared to the corresponding arc evaporation coating. It is smoother, has higher hardness and better adhesion to the substrate.
Hauser adds that the magnetron sputtering process may result in reduced adhesion of the coating to the substrate and reduced coating density compared to the arc deposition process, and its new HIPIMS+ coating technology overcomes these shortcomings.
The first generation of HIPIMS coating technology developed by Sheffield Hallam University and several partners including Hauser is a new type of magnetron sputtering technology. The peak power on the cathode is higher than that of conventional magnetism. The controlled sputtering process is several hundred times higher. Hauser pointed out that in order to achieve the required high ionization of the plasma, it is necessary to increase the peak power of the cathode. The main limitation of this technology for industrial applications is that it is slower to deposit than conventional magnetron sputtering processes.
To this end, Hauser has developed the second generation of HIPIMS+ technology. Compared to the first generation HIPIMS technology using pulses with a frequency of 200 microseconds and a peak cathode power of megawatts, the second generation HIPIMS+ technology uses a pulse frequency of 3.0 milliseconds and a cathode peak power of several hundred kilowatts. Therefore, this technique can obtain a dense, defect-free coating.
Hauser pointed out that the main advantage of HIPIMS+ technology is that the heat load on the coated workpiece is low. Therefore, (especially for heat-sensitive workpieces), it is possible to achieve a higher deposition speed by increasing the rated power, thereby making the technology economically industrially feasible.
Hauser offers HIPIMS+ coating technology and the corresponding Flexicoat coating equipment. The technology and its equipment are still under development and are expected to mature in a few years. The next step will be industrial production.
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